2nd International Conference on Data Driven Plasma Science

Plenary 2 : A. Bailey, Equipment Intelligence™: Plasma Science Driven by Semiconductor Data

auditorium

A. Bailey

H. Kino, Prediction ability and importance of descriptors of single-element physical sputtering yields based on sparse modeling

auditorium

H. Kino

Coffee break

Salle des Voûtes

S. Park, Control of the HARC Etching Processes in OLED Display Manufacturing Fab by Using the PI-VM Algorithm

auditorium

S. Park

H. Nakada, Data-driven Development of Plasma Process: Time-series Optimization of Etching Conditions Based on Reinforcement Learning

auditorium

H. Nakada

A. Solov’yov, MBN Explorer and Studio case studies with irradiation driven molecular dynamics

auditorium

A. Solov’yov

Lunch

Salle des Voûtes

Boat Tour to the Calanques